Develop image-based KPIs for high-power laser and Sn material alignment in ASML EUV Light Sources.
Originally posted 5 November 2026 by the employer.
About the role
This internship focuses on developing image-based Key Performance Indicators (KPIs) to evaluate laser and tin (Sn) material alignment in EUV Light Sources. You will analyze high-speed camera images from controlled experiments using machine learning and conventional image-processing techniques.
What you'll do
- Collect and organize high-speed image data and corresponding metadata from controlled EUV light source experiments.
- Extract relevant image features using conventional image-processing techniques and explore machine learning/AI methods.
- Develop one or more image-based KPIs that reliably describe the alignment between high-power lasers and Sn material.
- Validate proposed KPIs against performance measurements to confirm robustness across different operating conditions.
- Document analysis and findings in scripts, notebooks, and technical reports.
What you'll need
- Currently pursuing a bachelor's or master's degree in computer science, control systems, physics, applied mathematics, or a related technical field.
- Knowledge or experience using Python for data analysis.
- Familiarity with ML/AI-based image analysis methods, such as clustering, dimensionality reduction, or supervised learning.
- Ability to work with image datasets and document technical workflows in scripts and notebooks.
- Willingness and ability to work on-site in San Diego, CA, including working in a cleanroom environment wearing PPE.
- U.S. work authorization without employer sponsorship and eligibility to access controlled technology under Export Administration Regulations.
Skills: EUV, laser, image analysis, machine learning, Python, lithography
More semiconductor jobs: ASML jobs · Equipment engineering jobs · San Diego jobs
This role has been open 0 days — well below the 76-day median for Semiconductor Equipment Engineering roles.
Semiconductor Equipment Engineering · Lithography Systems
|
Open roles in category
59
|
Median days open
76 d
|
Category median salary (all employers)
$144k
|
See the full market breakdown ▾Category comparison, skills in demand, and who else is hiring
| Metric | ASML | All employers we track in this specialty (59 roles · 13 employers) |
|---|---|---|
| Open roles in this specialty | 36 | 59 |
| Open roles in the wider Process, Fab & Equipment family | 353 | 10147 · 117 employers |
| Median days open | 51 d | 76 d (−25 d vs this employer) |
| Median salary (USD postings) | — | $144k |
Skills observed across this category: EUV, laser, image analysis, machine learning, Python, lithography
Who's hiring in this category
- ASML (this employer) · 35 open roles · median 51 d
- Applied Materials · 4 open roles · median 125 d
- Micron Technology · 4 open roles · median 178 d
- GlobalFoundries · 3 open roles · median 135 d
- Onto Innovation · 3 open roles · median 105 d
- NXP Semiconductors · 2 open roles · median 133 d
How we counted: 59 open Semiconductor Equipment Engineering (Lithography Systems) roles from 13 employers tracked in the SemiconductorJobs index, counted 5 Nov 2026. Specialty figures count only roles carrying this exact specialty label, so an employer's related work in neighbouring specialties is not included there — it is counted in the wider Process, Fab & Equipment family row. Figures refresh nightly.