Senior/Principal Engineer, FE OCT CPEE PHOTO METROLOGY - Hiroshima - Fab 15, Japan
Originally posted 24 September 2026 by the employer.
About the role
This role involves leading yield, quality, productivity, and cost improvement initiatives for photo/overlay metrology in HVM manufacturing and new product introduction (NPI).
What you'll do
- Lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives.
- Resolve complex photo/overlay metrology issues through data-driven root-cause analysis.
- Define and deploy photo/overlay metrology Best Known Methods (BKM) across fabs for HVM and NPI.
- Act as the technical point for cross-fab, complex photo/overlay metrology customer concerns.
- Drive MOR–POR gap closure and cross-fab/node alignment in collaboration with internal teams and suppliers.
- Influence key suppliers and represent OCT in reviews, workshops, and governance forums.
What you'll need
- BS/MS/PhD in Electrical Engineering, Physics, Materials Science, Chemical Engineering, or related field.
- 5+ years (Senior) or 8+ years (Principal) experience in semiconductor photolithography in NPI/HVM manufacturing.
- Strong hands-on experience in photo/overlay metrology engineering (yield, quality, productivity, cost improvement).
- Proven experience in solving challenges involving overlay, CDU, metrology, reticle correction, MMM, destack, and yield matching.
- Experience defining and deploying Best Known Methods (BKM) across tools, nodes, or fabs.
- Ability to act as a technical point of contact for blocking issues and lead problem solving involving multiple functions.
Skills: photo metrology, overlay metrology, HVM manufacturing, CDU, reticle correction
This role has been open 0 days — well below the 55-day median for Process Engineering roles.
Process Engineering · Lithography Systems
|
Open roles in category
51
|
Median days open
55 d
|
Median salary
—
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See the full market breakdown ▾Category comparison, skills in demand, and who else is hiring
| Metric | Micron Technology | All employers we track in this specialty (51 roles · 16 employers) |
|---|---|---|
| Open roles in this specialty | 23 | 51 |
| Open roles in the wider Process, Fab & Equipment family | 1468 | 9525 · 109 employers |
| Median days open | 87 d | 55 d (+32 d vs this employer) |
| Median salary (USD postings) | — | — |
Skills observed across this category: photo metrology, overlay metrology, HVM manufacturing, CDU, reticle correction
Who's hiring in this category
- Micron Technology (this employer) · 22 open roles · median 93 d
- GlobalFoundries · 5 open roles · median 27 d
- STMicroelectronics · 4 open roles · median 25 d
- Texas Instruments · 3 open roles · median 23 d
- ASML · 2 open roles · median 47 d
- Coherent Corp · 2 open roles · median 44 d
How we counted: 51 open Process Engineering (Lithography Systems) roles from 16 employers tracked in the SemiconductorJobs index, counted 24 Sept 2026. Specialty figures count only roles carrying this exact specialty label, so an employer's related work in neighbouring specialties is not included there — it is counted in the wider Process, Fab & Equipment family row. Figures refresh nightly.