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SkyWater Technology

Photolithography Process Development Engineer - Kissimmee, FL 34744, United States

SkyWater Technology 200 NeoCity Wy, Kissimmee, FL 34744, United States 2 hours ago
Process & Device Engineering

Originally posted 3 September 2026 by the employer.

About the role

This role involves the development, optimization, integration, and continuous improvement of lithography processes for advanced semiconductor packaging and MEMS/Photonic device manufacturing.

What you'll do

  • Develop, optimize, transfer, and integrate lithography processes in a high-volume or advanced semiconductor manufacturing environment.
  • Develop and qualify robust, manufacturable photoresist and patterning processes for advanced packaging, MEMS, and photonic device applications.
  • Optimize lithography process conditions including resist coating, baking, exposure, development, descum, and associated process steps.
  • Support process integration of lithography with deposition, etch, CMP, metallization, and dielectric processes.
  • Utilize CD-SEM, optical metrology, profilometry, overlay metrology, defect inspection, and other characterization techniques to evaluate lithography performance.
  • Conduct Design of Experiments (DOE) to identify key process parameters and establish robust operating windows.

What you'll need

  • BS degree (5-10 years experience) in Electrical Engineering, Chemical Engineering, Materials Science, Mechanical Engineering, Physics, or a related engineering/scientific discipline.
  • Hands-on semiconductor fab processing experience with a strong understanding of lithography processes and equipment.
  • Experience with conventional photolithography processes including resist coating, soft bake, exposure, post-exposure bake, development, and resist strip.
  • Experience with a variety of lithography platforms and exposure technologies, including mask-based, direct-write, and maskless lithography.
  • Understanding of lithography process parameters including critical dimension, overlay, focus, dose, resist thickness, pattern fidelity, resolution, defectivity, and process window.
  • Experience with CD-SEM, optical microscopy, profilometry, overlay metrology, defect inspection, and other lithography characterization techniques.
  • Knowledge of DOE, SPC, Six Sigma, statistical analysis, and process capability concepts and applications.

Skills: lithography processes, photoresist, patterning processes, CD-SEM, DOE, process integration

Market context

This role has been open 43 days — well below the 63-day median for Process Engineering roles.

Process Engineering · Lithography Systems

Open roles in category
46
Median days open
63 d
Median salary
—
See the full market breakdown ▾Category comparison, skills in demand, and who else is hiring
How SkyWater Technology compares in Process Engineering hiring
Metric SkyWater Technology All employers we track in this specialty (46 roles · 12 employers)
Open roles in this specialty 2 46
Open roles in the wider Process, Fab & Equipment family 78 9874 · 109 employers
Median days open 54 d 63 d (−9 d vs this employer)
Median salary (USD postings) — —

Skills observed across this category: lithography processes, photoresist, patterning processes, CD-SEM, DOE, process integration

Who's hiring in this category

  • Micron Technology · 26 open roles · median 74 d
  • GlobalFoundries · 5 open roles · median 39 d
  • Coherent Corp · 2 open roles · median 67 d
  • SkyWater Technology (this employer) · 2 open roles · median 54 d
  • Skyworks · 2 open roles · median 163 d
  • STMicroelectronics · 2 open roles · median 38 d

How we counted: 46 open Process Engineering (Lithography Systems) roles from 12 employers tracked in the SemiconductorJobs index, counted 17 Oct 2026. Specialty figures count only roles carrying this exact specialty label, so an employer's related work in neighbouring specialties is not included there — it is counted in the wider Process, Fab & Equipment family row. Figures refresh nightly.

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200 NeoCity Wy, Kissimmee, FL 34744, United States
On-site
2 hours ago

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